NU 2020-243

INVENTORS

• Chad Mirkin*

• Eun Bi Oh

• Rustin Golnabi

• David Walker

SHORT DESCRIPTION
 

Electrochemical Polymer Pen Lithography (ePPL) is a novel lithographic technique that enables high-throughput nano- to micro-scale patterning of metallic inks using a hydrogel pen array integrated into a three-electrode cell.

BACKGROUND
 

The synthesis and prototyping of metal micro- and nano-structures are crucial in fields like electrocatalysis, electronics, and plasmonics. Traditional methods, such as electrochemical deposition, offer control over the volume and composition of metal features but are limited by their serial nature, making large-area patterning time-consuming and costly. Scanning probe techniques have shown promise but are similarly constrained by single-tip limitations. ePPL addresses these challenges by enabling massively parallel deposition, thus overcoming the limitations of conventional methods.

ABSTRACT
 

Electrochemical Polymer Pen Lithography (ePPL) represents a significant advancement in lithographic techniques, combining the scanning probe capabilities of Polymer Pen Lithography (PPL) with the flexibility of electrochemical deposition. This method utilizes a hydrogel pen array loaded with metal salts, integrated into a three-electrode cell, to achieve localized electrodeposition. The system allows for precise control over feature dimensions and composition, enabling the creation of alloy features relevant for catalysis. By eliminating the need for cleanrooms or vacuum environments, ePPL offers a scalable approach to large-area patterning, facilitating the rapid, high-throughput combinatorial screening of materials.

APPLICATIONS

• High-throughput 3D printing of nano/microstructures

  • Enables the creation of high-density interconnects, precision sensors, and more.

• Combinatorial library screening

  • Facilitates the exploration of catalytic single or multi-metallic materials.

• Biological studies

  • Allows for high-throughput deposition of conductive organic molecules.

ADVANTAGES

• Massively high-throughput

  • Significantly increases deposition speed compared to traditional methods.

• 3D printing capability

  • Supports the creation of complex 3D structures.

• x-y spatial encoding

  • Provides precise control over feature placement.

• Compositional control of alloys

  • Enables the synthesis of multi-metallic features with tailored properties.

PUBLICATIONS

Eun Bi Oh, Rustin Golnabi, David A. Walker, Chad A. Mirkin*, "Electrochemical Polymer Pen Lithography" Nano Micro Small, 10 June 2021.

IP STATUS
Issued US Patent 11,747,723